WebJun 30, 2024 · Here we describe the Room Temperature Wet Chemistry Growth (RTWCG) technology, a novel technology for growing highly uniform amorphous SiOX layers into silicon substrates [4]. These RTWCG SiOX layers mitigate PID when used as the first dielectric layer in a stacked SiOX / SiN ARC. WebMar 18, 2015 · Assignee: SPECMAT, Inc. Inventors: Horia M. Faur, Maria Faur Low- [HF] room temperature wet chemical growth (RTWCG) chemical formulation Patent number: 10619097 Abstract: This present invention relates to a Room Temperature Wet Chemical Growth (RTWCG) formulations, methods and processes.
Maria Faur Inventions, Patents and Patent Applications - Justia
WebDec 10, 2024 · SPECMAT RTWCG SiOX Orry F Subscribe 1 169 views 3 years ago The Room Temperature Wet Chemistry Growth (RTWCG) technology is a novel technology for growing highly uniform … WebJan 15, 2024 · RTWCG -SPECMAT, INC. The Room Temperature Wet Chemistry Growth (RTWCG) technology is a novel technology for growing highly uniform amorphous SiOx … pristylka 180x200
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WebSPECMAT has licensed the patented RTWCG process to Equity Solar Inc. and Equity Microelectronics Inc. of San Anselmo, California, to bring the technology to the commercial solar energy and microelectronics markets. “We believe the RTWCG technology has the potential to supplant traditional oxides in many different applica- WebThe Room Temperature Wet Chemistry Growth (RTWCG) technology is a novel technology for growing highly uniform amorphous SiOx layers into silicon substrates. It can be broken down into two kinds of applications: as a chemical etchant and as a SiOx growth chemistry.For etching applications, the RTWCG formulation is adjusted to maximize the ... WebSPECMAT, INC. is a Semiconductor Manufacturing, Semiconductor & Semiconductor Equipment, and Electronics company located in Rockford, Tennessee with $3.00 Million in … pristine life saint john